Gallium Nitride

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  Advanced Photonix, Inc.®
  GaN and SiC UV Detectors

  These UV, Gallium Nitride (GaN) and Silicon Carbide (SiC), sensors are intended for use in the spectral region of 200 nm to 400 nm where maximum quantum efficiency is required at these wavelengths. These devices are more robust in their resistance to UV degradation than traditional silicon photodiodes while providing greater photocurrent at shorter wavelengths. (read more)

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  TriQuint Semiconductor, Inc.
  TriQuint Opens Industry's 1st GaN Foundry Service

  GaN Foundry TriQuint's gallium nitride (GaN) Foundry is open for wafer starts in September 2008. Dr. Dr. Gailon Brehm, Product Marketing Director for TriQuint encourages companies interested in GaN designs to meet with TriQuint as a step toward production. The new service will target communications applications through the Ku frequency band. GaN-based amplifiers offer inherent advantages compared to other solid-state amplifier technologies including up to 2.5-times the power density of high... (read more)

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  Advanced Abrasives Corp.
  APol-80 Colloidal Silica

  APol-80 Colloidal Silica is formulated as a soft-drying polish for sapphire, ceramics, silicon carbide, gallium nitride, quartz and other hard substrates. APol-80 Colloidal Silica removes resid-ual metals and particle defects better than conventional silica slurries, mak-ing it the best final polish choice for re-claiming silicon wafers. APol-80 Colloidal Silica dries soft in order to eliminate scratches caused by dried pol-ish, and prevents polish equipment from being encrusted with hardened (read more)

  Browse Abrasives and Abrasive Products Datasheets for Advanced Abrasives Corp.
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  Logitech, Ltd.
  DP1 Precision Polishing Machine

  The Logitech DP1 is a high speed polishing system designed primarily to process hard materials, such as sapphire, silicon carbide or gallium nitride, to epitaxy ready quality surfaces. Key Features. Driven head technology dramatically. reduces polishing time for hard materials. Intuitive control panel provides easy access. to range of system features & parameters. Industry standard protocols provides for. improved health & safety features. Automated process recipes increase system... (read more)

  Browse Polishing and Buffing Machines Datasheets for Logitech, Ltd.
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  Saint-Gobain Surface Conditioning Group
  Lapping Vehicle for Sapphire Market

  atomically perfect surface which allows the deposition of GaN, Gallium Nitride, the material at the heart of the blue/white laser diode. We also offer a polishing slurry, 92400.20MIC12 Polycrystalline Alumina Slurry for this application. (read more)

  Browse Abrasive Compounds and Abrasive Slurries Datasheets for Saint-Gobain Surface Conditioning Group
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  TriQuint Semiconductor, Inc.
  New GaN 55W Amp Delivers Best-in-Class Linear Gain

  TriQuint's new T1G4005528-FS is a packaged discrete GaN RF power transistor offering best-in-class linear gain: >15dB, >55 Watts of compressed output power and > 50% efficiency (3.5 GHz.) The T1G4005528-FS is ideal for narrow and wideband applications. Since it can utilize a smaller driver in many designs, the T1G4005528-FS delivers 'greener' performance for overall line-up cost savings. It operates at 28V and is available in an earless ceramic package. Power, gain and efficiency can be... (read more)

  Browse RF Amplifiers Datasheets for TriQuint Semiconductor, Inc.
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  Avago Technologies
  Auto Focus Auxiliary Flash LED

  The Avago ASMT-Fx70 LEDs provide the best of both worlds, as they offer a small design footprint without sacrificing auto-flash performance.". The ASMT-FJ70 devices use Aluminum Indium Gallium Phosphate (AlInGaP) material technology and feature a 12 degree viewing angle, while the ASMT-FG70 devices use Indium Gallium Nitride (InGaN) material technology and provide a 14 degree viewing angle. Both technologies have very high luminous efficiency, producing high light output over a wide range of drive... (read more)

  Browse Light Emitting Diodes (LED) Datasheets for Avago Technologies
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  Rogue Valley Microdevices, Inc.
  Stoichiometric LPCVD Nitride film

  Rogue Valley Microdevices is proud to be your leading source of high quality LPCVD films. Our Stoichiometric LPCVD Nitride can be a very effective insulator, and works great as a KOH etch mask when deposited over thermal oxide. We also have the in-house capability to design and manufacture Nitride Windows. All of our processing is down in-house in our Class 100 Cleanroom in Medford, Oregon. Rogue Valley Microdevices engineering team can assist customers with the design, process flow... (read more)

  Browse Thin Film Coating Services Datasheets for Rogue Valley Microdevices, Inc.
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  Saint-Gobain Surface Conditioning Group
  Cubic Boron Nitride

  Cubic Boron Nitride, CBN is a high strength crystal, blocky in shape. Grit sizes available 50 / 60 through 325 / 400. This exceptional grain is intended for use on high precision grinding wheels. (read more)

  Browse Superabrasives and Diamond Tools Datasheets for Saint-Gobain Surface Conditioning Group
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  Rogue Valley Microdevices, Inc.
  PECVD Nitride for Semiconductor Wafers

  Our PECVD Nitride can be a great alternative to LPCVD Nitride when it becomes important to stay within lower temperature ranges. Widely used in MEMS and Semiconductor processing, PECVD nitride is a tensile stress film that can be used as a passivation layer, or to help balance film stress within a stack. Using PECVD Nitride in addition to PECVD Oxide will help to reduce overall film stress, preventing delaminating and micro-cracking. This is a Semiconductor Grade Single Side Deposition Film... (read more)

  Browse Thin Film Coating Services Datasheets for Rogue Valley Microdevices, Inc.