From Comdel, Inc.
Accurate energy demands on rf generating equipment for semiconductor processing continue to grow. As IC geometries shrink, so do process parameter tolerances. The actual amount, frequency spectrum and time duration of rf energy applied to a process has become increasingly critical to process performance. Power tolerances of 3-5% are no longer acceptable to many modern semiconductor processes.
Products & Services
Plasma Power Supplies
Plasma power supplies are DC and RF devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
Programmable Power Supplies
Programmable power supplies are digitally controlled power sources that provide accurate and adjustable levels of voltage, current, and frequency. They include a processor, voltage/current programming circuits, current shunt, and voltage/current read-back circuits.
AC Power Sources
AC power sources provide alternating power and typically have adjustable output values for the testing of component response at various voltages, current and frequency levels.
Power Supplies
Power supplies are devices that produce AC or DC power. This grouping includes current sources, DC power supplies, AC-DC adapters, DC-DC converters, AC power sources, and DC-AC inverters.
RF Generators
RF generators and high frequency power supplies provide the power required for plasma generation, induction heating, and radar or communications applications.
Topics of Interest
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Focusing on external and internal sources of contaminants has led to continuing improvements in the particle performance of PVD tools. As IC geometries continue to shrink because of market demands for...
Paul C. A. Roberts 6.1 Introduction The majority of signal amplitude or level measurements made at RF and microwave frequencies are measurements of power rather than voltage. Voltage measuring...
